Synchrotron Radiation Catalyst Dynamic Structure In-Situ Characterization Device Passed Acceptance

On December 26, the Planning and Finance Bureau of the Chinese Academy of Sciences organized experts at the Shanxi Institute of Coal Chemistry to conduct acceptance and result identification of the research project of the Chinese Academy of Sciences' research equipment "Dynamic Structure In-Situ Characterization of Catalysts Based on Synchrotron Radiation".

The Expert Committee for Acceptance Evaluation consists of 7 experts including Hu Tiandou, Xie Yaning, Professor Liu Haichao of Peking University, Professor Li Ruifeng, Professor Dong Jinxiang of Taiyuan University of Technology, Professor Zhao Yongxiang of Shanxi University, and Professor Yang Xiaofeng of North University of China. Lian Lianqing, Director of Intellectual Property Division, Bureau of Planning and Finance, Chinese Academy of Sciences, and Senior Engineer Zhang Hongsong, Science and Technology Conditions Division attended the meeting. More than 10 people including Wang Jianguo, director of the Shanxi Coal Chemical Institute, Hou Xianglin, director of the Science and Technology Development Department, and project team members attended the meeting.

Wang Jianguo and the project team members made the project team work report, user report and new report respectively. After listening to the report, the expert group reviewed the acceptance identification data, and through inquiries and discussions, the in-situ device developed by the project can meet the project's preset goals, meet the operating temperature, operating pressure and other design indicators, and can be applied to different Form of catalyst and medium.

The expert group believes that the project has completed the original plan and reached the predetermined target, and unanimously agreed that the project passed the acceptance. The expert group pointed out that the performance and application effect of the device have reached the international advanced level, and it is recommended to further optimize and improve the device and expand the application range.

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