Japan's ADVANCE RIKO Corporation summarized a variety of thin film deposition technologies and released an arc plasma deposition (APD) system. The working principle is mainly divided into three steps: first, after loading a high voltage on the trigger electrode, the charge in the capacitor is charged to the cathode (target); secondly, between the anode and the cathode (target) in the vacuum, the electrons form a creep Discharge, and generate a discharge loop, the target is heated and forms a plasma; finally, the plasma is controlled by a magnetic field to irradiate the substrate to form a film or a nanoparticle. How APD works The arc plasma deposition system utilizes five high-energy capacitors to change the charging voltage by changing the number of capacitors used to control the pulse energy, ultimately achieving the purpose of accurately controlling the thickness of the film. At the same time, the diameter of the nanoparticles can be precisely controlled in the range of 1.5 nm to 6 nm, and the activity is good and the yield is high. SEM and EDS spectra of Fe-Co nanoparticles prepared by APD The arc plasma deposition system is equipped with up to three deposition sources, and multiple targets can be used simultaneously/alternately, making it possible to prepare new compounds. Metal/semiconductor preparation simultaneously controls the atmosphere of the chamber to produce oxide and nitride films. In addition, high-energy plasma can ionize carbon targets and has a wide range of applications in carbon monoliths such as amorphous carbon, nanodiamonds, and carbon nanotube deposition and preparation. 1. The diameter of the nanoparticles can be controlled in the range of 1.5 nm to 6 nm by adjusting the discharge capacity. 2. The APD system is suitable for a variety of conductive targets, and the target system with a resistivity of less than 0.01 Ω.cm can be plasmaized. 3. Change the atmosphere of the system to prepare oxides or nitrides. The discharge of graphite in hydrogen produces super nanocrystalline diamonds. 4. The nanoparticles prepared by the system are used for catalysis, and the catalytic activity is higher than that of the wet preparation. 5. Model APD-P supports the powdering of nanoparticles. The Model APD-S is suitable for making uniform films on 2-inch substrates. Soundproofing Workplace Cabin,Portable Soundproof Phone Booth,Glass Soundproof Booth,Public Silence Booth For Airport Guangzhou Mingli Intelligent Equipment Co.,Ltd , https://www.minglibooth.com
